Siemens EDA is a global technology leader in Electronic Design Automation software. Our software tools enable companies around the world to develop highly innovative electronic products faster and more cost-effectively. Our customers use our tools to push the boundaries of technology and physics to deliver better products in the increasingly complex world of chip, board, and system design.
We are looking for a Computational Lithography Engineer to join our innovative LEAP (Learning through Exploration and Active Participation) team within the Calibre group. In this role, you will be at the forefront of developing advanced (e.g., machine learning models) for computational lithography, specifically focusing on mask 3-D and optical simulation models. Your work will be crucial in integrating these cutting-edge models into Calibre, the market-leading tool for mask correction and electronic design automation. This is an R&D position where you will be driving the future of computational lithography.
Responsibilities
* Develop and implement machine learning models for computational lithography, focusing on mask 3-D and optical simulation steps.
* Collaborate with cross-functional teams to integrate developed models into existing workflows.
* Conduct research on advanced machine learning techniques to improve the accuracy and efficiency of computational lithography models.
* Publish findings in leading scientific journals and present at industry conferences.
* Stay updated with the latest advancements in machine learning and computational lithography.
* Provide technical guidance and mentorship to junior researchers and engineers.
* Ensure that developed models meet the required performance and accuracy standards.
* Debug and troubleshoot issues related to model performance and accuracy.
* Document and maintain code and model repositories.
Required Knowledge/Skills, Education, and Experience
* Ph.D. in Computer Science, Electrical Engineering, or a related field with a focus on machine learning and/or scientific computing
* Minimum of 3 years of experience in developing machine learning models or in computational lithography
* Industry experience in computational lithography or a related field is preferred.
* Strong programming skills in C++ or Python and experience with machine learning frameworks such as TensorFlow or PyTorch.
* Excellent problem-solving skills and the ability to work independently and as part of a team.
* Strong written and verbal communication skills.
* Ability to travel for conferences and collaborative meetings.
Good to have
* Previous R&D experience in a semiconductor company or related field.
* Deep knowledge of advanced statistical methods and data analysis techniques.
* Proficiency with version control systems such as Git.
* A publication record in scientific journals and conference proceedings.
* Proficiency in C++ programming.
* Experience working with high-performance computing (HPC) environments.
* Familiarity with electronic design automation (EDA) tools and workflows.
This position will be subject to U.S. export control requirements under the International Traffic in Arms Regulations (ITAR) and/or Export Administration Regulations (EAR). Employment is contingent on either verifying the U.S. Person status or obtaining any necessary export license.
Why us?
Working at Siemens Software means flexibility - Choosing between working at home and the office at other times is the norm here. We offer great benefits and rewards, as you'd expect from a world leader in industrial software.
A collection of over 377,000 minds building the future, one day at a time in over 200 countries. We're dedicated to equality, and we welcome applications that reflect the diversity of the communities we work in. All employment decisions at Siemens are based on qualifications, merit, and business need. Bring your curiosity and creativity and help us shape tomorrow!
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